9031.41.00 - For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits)
Sub-classifications
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9031 4100 40
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9031 4100 60
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Overview
This HTS code, 9031.41.00, specifically covers optical instruments and appliances designed for the critical task of inspecting semiconductor wafers, devices, and the photomasks or reticles used in their manufacturing process. These instruments employ optical principles to detect minute defects, measure dimensions, or verify the integrity of these highly sensitive components. Their primary function is to ensure the quality and functionality of integrated circuits and other semiconductor-based technologies.
This category is distinguished from its sibling, 9031.49, which encompasses "Other" optical instruments and appliances not specifically defined within this particular heading. While 9031.41.00 is dedicated solely to semiconductor-related inspection, 9031.49 would cover a broader range of general-purpose optical measuring or checking instruments. Therefore, the defining characteristic for classification under 9031.41.00 is the explicit application within the semiconductor manufacturing ecosystem.
The subcategories further refine the scope of this classification by differentiating between the types of items being inspected. The subdivision for "For inspecting photomasks or reticles used in manufacturing semiconductor devices" addresses instruments used to examine the templates that define circuit patterns. In contrast, the alternative subdivision, "For inspecting semiconductor wafers or devices," covers instruments applied directly to the silicon substrate or the finished semiconductor components. This distinction is crucial for accurately identifying the specific application and purpose of the optical inspection equipment.