9031.41.00.20 - For inspecting photomasks or reticles used in manufacturing semiconductor devices 🖩
Details
| Field | Value |
|---|---|
| Unit of Quantity | No. |
| General Rate of Duty (Column 1 - General) | Free |
| Special Rate of Duty (Column 1 - Special) | N/A |
| Column 2 Rate of Duty | 50% |
| Quota Quantity | N/A |
| Additional Duties | N/A |
Overview
This classification pertains to specialized optical instruments and apparatus designed for the meticulous inspection of photomasks or reticles. These are critical components used in the photolithography process for manufacturing semiconductor devices, such as integrated circuits. The instruments in this category are engineered to detect minute defects, anomalies, or deviations from design specifications on these patterned plates before they are used in semiconductor fabrication.
It is crucial to distinguish this category from its sibling, "For inspecting semiconductor wafers or devices." While both relate to semiconductor manufacturing, this node exclusively focuses on the inspection of the intermediate tools (photomasks/reticles) rather than the finished or in-process semiconductor wafers or the final integrated circuits themselves. The function is therefore on verifying the integrity of the pattern transfer medium, not the semiconductor substrate.
As a leaf node, this HTS code represents the most specific level for this particular type of inspection equipment. Classification at this level emphasizes the direct application of the optical instrument to the photomask or reticle. Examples of goods that would fall here include automated optical inspection (AOI) systems specifically calibrated and designed for photomask metrology and defect detection, ensuring the accuracy and quality of the stencil used in creating microelectronic patterns.